Large area synthesis of thin alumina films by laser ablation
Yazarlar (4)
B Hirschauer
Jan Paul
AS Flodström
Makale Türü Özgün Makale (Uluslararası alan indekslerindeki dergilerde yayınlanan tam makale)
Dergi Adı Applied surface science
Makale Dili – Basım Tarihi 08-1996
Cilt / Sayı / Sayfa 99 / 4 / 285–291 DOI –
Makale Linki https://www.sciencedirect.com/science/article/pii/016943329600462X
UAK Araştırma Alanları
Dedektör Teknolojisi
Özet
Al2O3 has been ablated on commercially available 3″ silicon wafers at different distances between the target and the substrate and laser fluencies. ‘Amorphous’ Al2O3 (γ-alumina with grain size <20 nm) was grown by pulsed laser deposition at room temperature. The structure, the morphology, the profile and the composition of the produced films have been investigated. Fully oxidised thin films (thickness ≤5 μm) with high uniformity and smoothness were synthesised without additional oxygen gas during the ablation. The quality of the films was independent of the ablation fluency and of the distance between target and substrate.
Anahtar Kelimeler
BM Sürdürülebilir Kalkınma Amaçları
Atıf Sayıları
Google Scholar 12

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