Fabrication of p-Si/n-NiO:Zn photodiodes and current/capacitance-voltage characterizations
Yazarlar (1)
Doç. Dr. Seval AKSOY PEHLİVANOĞLU Sinop Üniversitesi, Türkiye
Makale Türü Özgün Makale (SSCI, AHCI, SCI, SCI-Exp dergilerinde yayınlanan tam makale)
Dergi Adı Physica B Condensed Matter (Q2)
Dergi ISSN 0921-4526 Dergi Bilgileri (2021)
Dergi Tarandığı Indeksler SCI-Expanded
Makale Dili İngilizce Basım Tarihi 02-2021
Cilt / Sayı / Sayfa 603 / 1 / – DOI 10.1016/j.physb.2020.412482
Makale Linki http://dx.doi.org/10.1016/j.physb.2020.412482
UAK Araştırma Alanları
Yarı İletkenler
Özet
The present study includes the results of a series of studies on the appropriateness of their use as photodiodes after investigating some of the physical properties of Zn doped NiO films by the sol-gel spin coating technique. The morphological properties of the films were examined and it was determined that the Zn additive provides the formation of smoother films. The T% and E g value of the films decreased with the Zn dopant. I− V measurements have shown that all films are light sensitive. The ideality factors of the photodiodes were calculated and the lowest ideality factor was reported as 4.31 for the p− S i/n− N i O: 0.5% Z n/A l photodiode. The photosensitivity of photodiodes was investigated and it was determined that they exhibit linear photoconductivity behavior. The highest R R value was observed at p− S i/n− N i O: 0.5% Z n/A l photodiode among all photodiodes. The barrier height of photodiodes was …
Anahtar Kelimeler
Current/capacitance voltage measurements | Nickel oxide | Photodiode | Sol-gel | Zinc
Science Direct
BM Sürdürülebilir Kalkınma Amaçları
Atıf Sayıları
Scopus 12
Google Scholar 15
Fabrication of p-Si/n-NiO:Zn photodiodes and current/capacitance-voltage characterizations

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